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Manual substrate WE WOULD LIKE TO BUY YOUR KARL SUSS Large Gap Mask Aligner. Karl Suss MA6 Mask Aligner Standard Operating Procedure Faculty Supervisor: Prof. Robert White, Mechanical Engineering (x ) Safety Office: Peter Nowak x (Just dial this directly on any campus phone. ) (617) (From offcampus or from a cell phone) Tufts Emergency Medical Services are at x. Request for Used Equipment. MJB4 UV400 UV250 Manual Aligner. The MJB4 is the next generation version of the MJB3 which has set industry standards.

Manual Aligner. The SUSS MA6 Mask Aligner is regarded as the benchmark in semiconductor submicron research and 3D After cooling, the samples were ultraviolet (UV) exposed on a mask aligner (MA6 Suss MicroTec, Munich, Germany) with an exposure dose of 250 mJcm 2 through an iline filter (G Suss MicroTec, Munich, Germany) and a photolithographic mask (chrome on soda lime glass, JD Phototools, Oldham, UK).

The samples were postbaked during 1 min at The EVG 620 Mask aligner is configured for top and backside alignment. It has a manual cassette load with UV400 exposure optics (365nm) and 10x objective lens. The alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput.

Center for Nanoscale Systems. Harvard University Karl Suss MA6 Mask Aligner User Manual If anything unusual, contact Ling Xie @, or Steve Shepard @. Manual MA6 Download as PDF File (. pdf), Text File (. txt) or read online. mask aligner ma6 Once the mask and wafer are loaded the aligner proceeds to expose skipping the alignment step. 7. 4. Alignment Features. Top side: TSA, the top microscope is used to align mask features to the topside of the wafer. Find great deals on eBay for mask aligner.

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